Next Generation of International Chem: A Critical Review of Current US Patents

Next Generation of International Chem: A Critical Review of Current US Patents

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Next Generation of International Chem: A Critical Review of Current US Patents

Next Generation of International Chem: A Critical Review of Current US Patents

$143.00

The objective is writing �Next Generation Chemical Additives� to identify the next generation chemical additives for eight selected industries.\n\nThe text will also provide methods for their preparation, additive treatment levels, and testing methods to evaluate additive performance. To ensure optimum performance of materials and products, chemists, formulators, and blenders must be provided with the most current information on existing chemical additives. It is even more essential that corporate operations officers can easily identify the next generation of chemical additives. In addition to this a critical comparison will be given with the existing additives.Structural and physical properties as well as low and elevated temperature toxicity information provided in an easy to understand format Highlights the advantages of the selected additive over existing agents Applications using the newly identified chemical additive provided for existing commercial materials and products The most direct method for preparing the chemical agent described Simplistic and sophisticated method for characterizing the chemical agent provided Next Generation of International Chemical Additives: A Critical Review of Current US Patents is written by De Rosa, Thomas F. and published by Elsevier (S&T). ISBNs for Next Generation of International Chemical Additives: A Critical Review of Current US Patents are 9780444537898 and the print ISBNs are 9780444537881, 0444537880.

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TypeNew Arrivals
SKUGC-8000317875
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